Revolutionizing industrial cleaning processes for a sustainable future.

Photoresist Stripper with Focus on Negative Laquers

This effective fluid removes positive and negative photoresists gently, quickly and efficiently. It is suitable for use in LED, MEMS and display manufacturing applications. It can penetrate, fragment and lift off resist films from the sub-µ range up to > 250 µm.

Featuring a water-based formulation with intelligent fluids’ patented technology, it efficiently lifts contaminants and residues without aggressive chemical dissolution, ensuring safety and innovation. It is non-flammable and a favourable alternative to NMP.

This innovative fluid is especially designed for Parts Cleaning. With its outstanding formulation it is the ideal solution for plastic and stainless steel surfaces.
This solution specializes in the gentle removal of both positive and negative photoresists. Its effectiveness spans diverse manufacturing applications, lifting resist films while ensuring safety, innovation, and environmental consciousness. Making it the ideal choice for manual cleaning.
This water-based and non-flammable product offers a gentle and efficient way of removing photoresists, making it a favorable alternative to NMP.

Achieve
Greater Sustainability
with our Solutions

Intelligent fluids technology intrinsically supports 10 of the 17 UN Sustainable Development Goals.

The majority of our products have no hazardous classification, ensuring safer operations.

Substitute for harmful aggressive solvents such as Acetone, NMP and DMSO.

Certified according to ISO 9001 and ISO 14001.

Product Data Sheet

Ingredients

Materials

Longevity

pH value

6.3