Equipment Cleaner for cleaning in semifabs

This outstanding product removes many organic contaminants in the semiconductor and display industry (e.g. degas chamber cleaning, oven cleaning, general coater cleaning), it is even suitable for removing centimetre-thick photoresist layers from
coater catch cups. The cleaning product is already effective at a low and resource-saving process temperature of 20 – 40 °C and is characterized by excellent rinsability, making it a substitute for solvents such as NMP, acetone, or similar.

Featuring a water-based formulation with intelligent fluids’ patented technology, it efficiently lifts contaminants and residues without aggressive chemical dissolution, ensuring safety and innovation. It is non-flammable and especially user-friendly.